TESTBOURNE Trademark Information

Testbourne Limited

Chemical elements and chemical compounds for use as sputtering targets in the manufacture of a wide variety of goods; chemical elements and chemical compounds for use as evaporation sources in the manufacture of a wide variety of goods; chemical elements and chemical compounds for use as magnetron sputtering sources in the manufacture of a wide variety of goods; chemicals for use in industry, science and photography, namely, aluminum, antimony...

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Words that describe this mark

chemical   elements   chemical   compounds   use   sputtering   targets   manufacture   wide   variety   goods   chemical   elements   chemical   compounds   use   evaporation   sources   manufacture   wide   variety   goods   chemical   elements   chemical   compounds  

This is a brand page for the TESTBOURNE trademark by Testbourne Limited  in Basingstoke, Hants, , RG24 8FL.

Write a review about a product or service associated with this TESTBOURNE trademark. Or, contact the owner Testbourne Limited of the TESTBOURNE trademark by filing a request to communicate with the Legal Correspondent for licensing, use, and/or questions related to the TESTBOURNE trademark.

On Thursday, December 7, 2000, a U.S. federal trademark registration was filed for TESTBOURNE. The USPTO has given the TESTBOURNE trademark serial number of 76177386. The current federal status of this trademark filing is REGISTERED AND RENEWED. The correspondent listed for TESTBOURNE is Ronald E. Shapiro of SHAPIRO AND SILVERSTEIN PLLC, 11350 RANDOM HILLS ROAD, SUITE 740, FAIRFAX, VA 22030 . The TESTBOURNE trademark is filed in the category of Chemical Products . The description provided to the USPTO for TESTBOURNE is Chemical elements and chemical compounds for use as sputtering targets in the manufacture of a wide variety of goods; chemical elements and chemical compounds for use as evaporation sources in the manufacture of a wide variety of goods; chemical elements and chemical compounds for use as magnetron sputtering sources in the manufacture of a wide variety of goods; chemicals for use in industry, science and photography, namely, aluminum, antimony, arsenic, barium, beryllium, bismuth, boron, cadmium, cerium, cesium, chromium, cobalt, copper, dysprosium, erbium, europium, gadolinium, gallium, germanium, graphite, gold, hafnium, holmium, indium, iridium, iron, lanthanum, lead, lithium, lutetium, magnesium, manganese, molybdenum, neodymium, nickel, niobium, osmium, palladium, phosphorous, platinum, praseodymium, rhenium, rhodium, rubidium, ruthenium, samarium, scandium, selenium, silicon, silver, sodium, strontium, sulphur, tantalum, tellurium, terbium, thallium, thulium, tin, titanium, tungsten, vanadium, ytterbium, yttrium, zinc, zirconium, borides, carbides, fluorides, nitrides, oxides, silicides, selenides, sulphides, tellurides, ammonium compounds, alloys, metal alloys, compounds of aluminum, antimony, arsenic, barium, beryllium, bismuth, cadmium, cerium, caesium, chromium, cobalt, copper, dysprosium, erbium, europium, gadolinium, gallium, germanium, graphite, gold, hafniurn, holmium, indium, iodine, iridium, iron, lanthanum, lead, lithium, lutetium, magnesium, manganese, mercury, molybdenum, neodymium, nickel, niobium, palladium, phosphorous, platinum, potassium, praseodymium, rhenium, rubidium, ruthenium, samarium, scandium, selenium, silicon, silver, sodium, strontium, tantalum, tellurium, terbium, thallium, thulium, tin, titanium, tungsten, vanadium, ytterbium, yttrium, zinc and zirconium, polymers for use as sputtering targets, acrylonitrile butadiene styrene, chlorinated polyvinyl chloride, chlorotrifluoro-ethylene, polyethylene, polyetheretherketone, polyethylene teraphthalate, polyethylene teraphthalate modified with cyclohexane dimethanol, polyvinyl chloride, polyvinylidene fluoride, polytetrafluoroethylene and polyamide, silicon monoxide, filaments of tungsten;[ photographic chemicals; fluids for hydraulic circuits and vacuum pumps; fluids for use with abrasives used in the scientific examination of samples by electron-microscopy, laboratory analysis processes, precision cutting, grinding and polishing of metallics, glasses and ceramic components used in the aerospace, automotive, capacitor, electrical resistor and electro-optical, electro-medical, magnetic, micro-electronic, optical and sensor industries; high vacuum fluids for use in pumps specific to the high vacuum industry, namely, mechanical and vapor diffusion pumps;] high purity chemicals for use in thin vapor deposition CVD in atmospheric pressure, high vacuum and ultra vacuum processing applications for the manufacture of computers, microprocessors, flat bed display screens, magnetic recording heads, semi-conductor devices and super-conductive devices, electrical components, namely, resistors, capacitors, and cathode-ray tubes, vacuum distillation and freeze drying of foodstuffs, metallurgy, pharmaceutical, and optical industries; adhesives used in manufacturing, namely, high vacuum adhesives and ultra-high vacuum sealing adhesives, low-temperature waxes for mounting optical components during polishing processes, and silver epoxy resins for bonding sputtering targets to sputtering sources.

Word mark: TESTBOURNE
Status/Status Date:
REGISTERED AND RENEWED
7/29/2015
Serial Number: 76177386
Filing Date: 12/7/2000
Registration Number: 2916854
Registration Date: 1/11/2005
Goods and Services: Chemical elements and chemical compounds for use as sputtering targets in the manufacture of a wide variety of goods; chemical elements and chemical compounds for use as evaporation sources in the manufacture of a wide variety of goods; chemical elements and chemical compounds for use as magnetron sputtering sources in the manufacture of a wide variety of goods; chemicals for use in industry, science and photography, namely, aluminum, antimony, arsenic, barium, beryllium, bismuth, boron, cadmium, cerium, cesium, chromium, cobalt, copper, dysprosium, erbium, europium, gadolinium, gallium, germanium, graphite, gold, hafnium, holmium, indium, iridium, iron, lanthanum, lead, lithium, lutetium, magnesium, manganese, molybdenum, neodymium, nickel, niobium, osmium, palladium, phosphorous, platinum, praseodymium, rhenium, rhodium, rubidium, ruthenium, samarium, scandium, selenium, silicon, silver, sodium, strontium, sulphur, tantalum, tellurium, terbium, thallium, thulium, tin, titanium, tungsten, vanadium, ytterbium, yttrium, zinc, zirconium, borides, carbides, fluorides, nitrides, oxides, silicides, selenides, sulphides, tellurides, ammonium compounds, alloys, metal alloys, compounds of aluminum, antimony, arsenic, barium, beryllium, bismuth, cadmium, cerium, caesium, chromium, cobalt, copper, dysprosium, erbium, europium, gadolinium, gallium, germanium, graphite, gold, hafniurn, holmium, indium, iodine, iridium, iron, lanthanum, lead, lithium, lutetium, magnesium, manganese, mercury, molybdenum, neodymium, nickel, niobium, palladium, phosphorous, platinum, potassium, praseodymium, rhenium, rubidium, ruthenium, samarium, scandium, selenium, silicon, silver, sodium, strontium, tantalum, tellurium, terbium, thallium, thulium, tin, titanium, tungsten, vanadium, ytterbium, yttrium, zinc and zirconium, polymers for use as sputtering targets, acrylonitrile butadiene styrene, chlorinated polyvinyl chloride, chlorotrifluoro-ethylene, polyethylene, polyetheretherketone, polyethylene teraphthalate, polyethylene teraphthalate modified with cyclohexane dimethanol, polyvinyl chloride, polyvinylidene fluoride, polytetrafluoroethylene and polyamide, silicon monoxide, filaments of tungsten;[ photographic chemicals; fluids for hydraulic circuits and vacuum pumps; fluids for use with abrasives used in the scientific examination of samples by electron-microscopy, laboratory analysis processes, precision cutting, grinding and polishing of metallics, glasses and ceramic components used in the aerospace, automotive, capacitor, electrical resistor and electro-optical, electro-medical, magnetic, micro-electronic, optical and sensor industries; high vacuum fluids for use in pumps specific to the high vacuum industry, namely, mechanical and vapor diffusion pumps;] high purity chemicals for use in thin vapor deposition CVD in atmospheric pressure, high vacuum and ultra vacuum processing applications for the manufacture of computers, microprocessors, flat bed display screens, magnetic recording heads, semi-conductor devices and super-conductive devices, electrical components, namely, resistors, capacitors, and cathode-ray tubes, vacuum distillation and freeze drying of foodstuffs, metallurgy, pharmaceutical, and optical industries; adhesives used in manufacturing, namely, high vacuum adhesives and ultra-high vacuum sealing adhesives, low-temperature waxes for mounting optical components during polishing processes, and silver epoxy resins for bonding sputtering targets to sputtering sources
Mark Description: NOT AVAILABLE
Type Of Mark: TradeMark
Published For Opposition Date: 10/19/2004
Last Applicant/Owner: Testbourne Limited
Basingstoke, Hants RG24 8FL
Mark Drawing Code: Typeset (Words/letter/Number)
Design Search: (NO DATA)
Register Type: Principal
Disclaimer: (NOT AVAILABLE)
Correspondent:
SHAPIRO AND SILVERSTEIN PLLC
11350 RANDOM HILLS ROAD, SUITE 740
FAIRFAX, VA 22030

Classification Information

Use in Commerce Trademark - Applicant has provided proof of use of this mark in commerce to USPTO.

Primary Class: Class Details:
Class (001)
Chemicals used in industry, science and photography, as well as in agriculture, horticulture and forestry; unprocessed artificial resins; unprocessed plastics; manures; fire extinguishing compositions; tempering and soldering preparations; chemical substances for preserving foodstuffs; tanning substances; adhesives used in industry.
First Use Anywhere: : Not provided
First Use In Commerce: Not provided

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Current Trademark Status:
7/29/2015
REGISTERED AND RENEWED
Correspondent Search:

Ronald E. Shapiro is a correspondent of TESTBOURNE trademark.

Current Overall Rating:
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