VANTAGE VULCAN Trademark Information

Trademark by Applied Materials, Inc.

Semiconductor wafer processing equipment, and components, namely, epitaxial reactors, rapid thermal annealing reactors, chemical vapor deposition reactors, physical vapor deposition reactors, plasma etchers, ion implanters, and chemical mechanical polishers, and monitoring equipment; all for the processing and production of semiconductor substrates, thin films, silicon discs and wafers

Classification Information

Use in Commerce Trademark - Applicant has provided proof of use of this mark in commerce to USPTO.

Primary Class: Class Details:
Class (007)
Machines and machine tools; motors and engines (except for land vehicles); machine coupling and transmission components (except for land vehicles); agricultural implements other than hand-operated; incubators for eggs.
First Use Anywhere:: 12/14/2015
First Use In Commerce: 12/14/2015
General Information
Word mark: VANTAGE VULCAN
Status/Status Date:
REGISTERED
12/4/2018
Serial Number: 87476876
Filing Date: 6/6/2017
Registration Number: 5623534
Registration Date: 12/4/2018
Goods and Services: Semiconductor wafer processing equipment, and components, namely, epitaxial reactors, rapid thermal annealing reactors, chemical vapor deposition reactors, physical vapor deposition reactors, plasma etchers, ion implanters, and chemical mechanical polishers, and monitoring equipment; all for the processing and production of semiconductor substrates, thin films, silicon discs and wafers
Mark Description: NOT AVAILABLE
Type Of Mark: TradeMark
Published For Opposition Date: 10/17/2017
Last Applicant/Owner:
Applied Materials, Inc.
Santa Clara, CA 95054
Mark Drawing Code: Standard Character Mark
Design Search:
(NO DATA)
Register Type: Principal
Disclaimer: (NOT AVAILABLE)
Correspondent:
Alan Taboada
Moser Taboada
1030 Broad Street - Suite 203
Shrewsbury, NJ, 07702
Current Status:
REGISTERED
12/4/2018
Correspondent Search:
Alan Taboada is a correspondent of VANTAGE VULCAN trademark.
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